Description of Top-Down technics for the nanofabrication:
- Definition and history of the Top-Down approach. Comparison with the Bottom-up approach: avantages and disavantages.
- Lithography: main principles, optical lithography (DUV, EUV, RX), electronic lithography, ion etching
- Nanoimprint, nanomolding, nanostamp
- Scanning probe microscopy patterning: AFM & STM
Some of these technics will be studied in practical works, together with growth processes and characterization technics: CVD, RTP, ion etching, MBE, Dip-Coating, nanoimprint, laser ablation.
Topics :
- Top-Down technics
- CVD, RTP, ion etching: fabrication of ordered quantum
- EJM : fabrication of strained layers SiGe/Si
- Sol-Gel : fabrication of anti-reflective layers
- Laser ablation